Materials and Processes for Next Generation Lithography – Ebook PDF Instant Delivery – ISBN(s): 9780081003541,0081003544
Product details:
- ISBN-10 : 0081003544
- ISBN-13 : 978-0081003541
- Author: Alex Robinson , Richard Lawson
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.
These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.
Table of contents:
Chapter 1. Overview of materials and processes for lithography
Chapter 2. Molecular excitation and relaxation of extreme ultraviolet lithography photoresists
Chapter 3. Theory: Electron-induced chemistry
Chapter 4. EUV lithography process challenges
Chapter 5. EUV lithography patterning challenges
Chapter 6. The chemistry and application of nonchemically amplified (non-CA) chain-scission resists
Chapter 7. Chemically amplified resists and acid amplifiers
Chapter 8. Negative-tone organic molecular resists
Chapter 9. Positive molecular resists
Chapter 10. Mainstreaming inorganic metal-oxide resists for high-resolution lithography
Chapter 11. Molecular organometallic resists for EUV (MORE)
Chapter 12. SML electron beam resist: Ultra-high aspect ratio nanolithography
Chapter 13. Alternative resist approaches
Chapter 14. Next generation lithography—the rise of unconventional methods?
Chapter 15. Tip-based nanolithography methods and materials
Chapter 16. Thermal scanning probe lithography
Chapter 17. Scanning helium ion beam lithography
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